25 Jun 2021
16:15 - 17:55
Natur & Technik
NanoEngineering gone #viral / Optical Lithography, the key enabler for Moore’s Law
Public keynote lectures at the Swiss NanoConvention 2021 by Prof. Dr. Nicole F. Steinmetz (University of California, San Diego) and Dr. Jos Benschop (ASML)
NanoEngineering gone #viral
Nanoscale engineering is revolutionizing the way we detect, prevent and treat diseases. Viruses are playing a special role in these developments because they can function as prefabricated nanoparticles.
We utilize and build-upon the high-precision assemblies of the viral capsids and utilize them as platform technologies, engineered and repurposed for a desired function. More specifically, we turned toward plant viruses as a platform nanotechnology targeting human, veterinary and plant health applications. Through chemical biology, we have developed virus-based therapeutics and vaccines and I will highlight applications in cancer immunotherapy and COVID-19.
Prof. Dr. Nicole F. Steinmetz is a Professor of NanoEngineering at the University of California, San Diego and the Founding Director of the Center for Nano-ImmunoEngineering. She received her PhD in Bionanotechnology from the University of East Anglia, where she wrote her dissertation at the John Innes Centre, Norwich. In 2018 she became full professor at Case Western Reserve School of Medicine in Cleveland, Ohio. Thereafter she joined the University of California, San Diego. Her research interests include plant virus-based nanoparticles, vaccines and immunotherapy, drug delivery targeting human health, precision farming and agricultural nanotechnology. Among many honors she received Daniela Pucci Prize at NanoPlasm 2016 and was recognized by National Nanotechnology Initiative (NNI) during Women’s History Month.
Optical Lithography, the key enabler for Moore’s Law.
For more than 50 years the electronics industry has enabled a revolution in our daily life due to ever decreased feature sizes on our chips enabling faster, cheaper and more energy efficient computing and data storage. This trend is commonly referred to as Moore’s Law. To this day optical lithography has been the key enabler for Moore’s Law. As pointed out by Gordon Moore in his 1995 SPIE presentation, the “contribution from increased density from finer line widths has been constant over the last 25 years”, a trend which continues to this day.
For decades this has been made possible through a combination of wavelength reduction, increased numerical aperture (NA) and pushing imaging closer to the physical limit. The latest transition of wavelength has been the largest step in wavelength ever: from 193 nm ArF to 13.5nm EUV light. A transition which took decades of research and development leading to the first commercial phones, with ICs patterned using EUV, on the market in 2019.
In the presentation it will be summarized how a ASML grow from small spin-off to a multinational leading in technology and market share. Solutions to technical challenges that had to be overcome for EUV lithography will be shared, e.g. the atomic flat aspheric optics and the high power EUV source. State-of-art performance as well as next steps in the optical lithography roadmap will be shared.
Dr. Jos Benschop received his MSc (cum laude) and PhD from physics faculty in Twente University. From 1984 until 1997 he worked at Philips on optical metrology and optical recording. He joined ASML in 1997. As Senior Vice President Technology he is responsible for research and system engineering within ASML. He has published 30+ papers and generated 20+ patents. He is an SPIE fellow and part-time professor “NNV leerstoel Industriële Natuurkunde” at the University of Twente. He is a member of the Netherlands Academy of Technology and Innovation . He has been appointed by the Dutch king as advisor to the Dutch government on science, technology and innovation.
To register, please visit https://2021.swissnanoconvention.ch
Swiss Nanoscience Institute
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